The closed field magnetron (CFM) reactive magnetron sputtering systems are designed specifically for the deposition of precision single and multilayer optical coatings. The design is such that all samples are in the
same deposition and plasma environment. Coating quality is assured by the use of the “closed field” configuration and magnetron sources, which create an intense plasma and high ion current density at the substrates.
The compact design, combined with high power density results in short cycle times. Metal oxides, metal nitrides, transparent conductive oxides, carbides, pure metals and alloys can all be deposited using pure metal targets. The optical properties exhibit minimum absorption and optimized refractive index. Metals, metal oxides, carbides and nitrides can be deposited at high rates.
The CFM series of systems has been developed as a result of a continuing and intensive development program and offers an unrivalled combination of flexibility, reliability, controllability and ease of use. The systems are fully computer controlled as standard, enabling simple, accurate and repeatable processing without the need for constant supervision.
A summary of the four CFM system platforms are provided in the following table.